激光加熱不僅僅加熱迅速快，更重要的是它的穩(wěn)定性與加熱均勻的特性，不是一般電阻絲加熱器所能比擬的。我們的激光加熱只有樣品拖是熱的，其他的部件相對(duì)傳統(tǒng)加熱器來(lái)說(shuō)相當(dāng)冷，所以它的機(jī)械性能就比較好。不會(huì)在真空中卡住，或者是有大幅度的放氣，導(dǎo)致樣品表面之前的雜質(zhì)又回鍍到樣品的表面，這是激光加熱最大的好處，同時(shí)因?yàn)榧訜崞鞑辉谡婵涨惑w內(nèi)，所以不會(huì)有加熱器故障的問題。
我們的激光加熱器加熱樣品架在所有PLD的應(yīng)用里有世界最大的激光功率200W，所以可以非常輕易的到達(dá)1000攝氏度以上的溫度，而且尤有余裕。當(dāng)樣品成長(zhǎng)需要高氣壓的時(shí)候，功率馬上跟上，不需要慢慢等樣品由冷變熱回到原來(lái)的溫度。可以安裝紅外線測(cè)溫儀，量測(cè)樣品表面的實(shí)際溫度。我們有兩寸激光加熱器與高功率的觸酶催化劑的應(yīng)用。歡迎各位科學(xué)家前來(lái)咨詢。
我們用我們的激光加熱器成功的幫助數(shù)位科學(xué)家解決了加熱溫度低的問題。
5-AXES UHV LASER HEATING MANIPULATOR
MAIN SPECIFICATIONS:
COMPATIBILITY TO OXYGEN-RICH OR ANY ATMOSPHERIC CONDITIONS
Designing a high temperature heater for UHV thin-film deposition systems which can work in oxygen-rich or any atmospheric conditions is not easy. Conventional heating materials and mechanisms generate additional vapor pressure from its heating component materials which limits the achievable UHV condition, and oxidize its heating components which consequently deteriorate the heating material and process quality
There are some techniques to overcome this problem, such as Platinum heating element, SiC heating element with well-designed shape, etc. However, each methods has their own issues, such as high maintenance frequency, short life time due to oxidation of heating components, etc.
AdNaNoTek's Laser heating manipulator is developed as a perfect solution for heating your sample for UHV thin-layer deposition in oxygen-rich and any atmospheric conditions. It does not possess the disadvantages that other heaters have. In addition, it is easy-to-use, compact, customizable, and has fast and localized heating mechanism. It is equipped with a pyrometer to monitor the temperature, and has a system control software to automatically control the laser heating parameters and processes. AdNaNoTek's Laser Heating Manipulator is very suitable for laser oxide/nitride epitaxial techniques.
LASER CONTROLLER COMBINES NUMBER OF LEADING TECHNOLOGIES SUCH AS...
ADVANTAGES
OPTIONAL
