我們的雙電子束蒸發(fā)系統(tǒng)有如下優(yōu)點：
腔體適中，不會太大也不會太小。可使用冷泵或者大抽速分子泵。所以抽氣速度很快。在使用分子泵的情況下，非常節(jié)能省電。極限真空8E-8torr。我們的樣品架有幾種可以供客戶選擇：1、單傘鍋，只能自轉(zhuǎn)。2、多傘鍋，可行星式旋轉(zhuǎn)。3、選擇與傾斜的樣品架（此技術(shù)本公司獨有），在特殊情況下可保證樣品不超過80攝氏度，這對工藝要求比較嚴苛使用者來說非常重要，因為光刻膠遇到高溫會起泡，所以希望溫度越低越好。適用于金屬沉積，金屬剝離工藝。
電子槍可選用日本愛發(fā)科，美國泰利瑪，雙晶振可以減少因晶振失誤導致的樣品報廢的困擾。
我們有另外一型單電子束熱蒸發(fā)聯(lián)用系統(tǒng)。
UHV Dual E-Beam Evaporator (EBS300)
AdNaNoTek’s Dual EBS300 can deposit large-scale thin-film with extremely high quality and a great repeatability. It is equipped with 2 e-beam sources. Each e-beam sources is installed with multiple target crucibles which can store up to maximum of 6 target materials. Since it has 2 e-beam sources, this allows simultaneous deposition of 2 different materials onto your substrates. In addition, it is also equipped with sample planetary mechanism which rotate and revolve multiple samples. This allows precise and simultaneous deposition of in many substrates while significantly improving the uniformity and quality of the deposited thin-film.
Furthermore, precise control and high stability is achieved by making the process automated with the use of the AdNanoTek's FBBEAR system control software. FBBEAR, provides complete data logging, precise parameter tuning, and automatic parameter setting of the deposition process. This makes the deposition process to be operated with ease, fully automated, user-friendly, consistent, and will give reliable experimental repeatability.
E-Beam evaporator can be applied for thin layer deposition of materials like: metals (Al, Nb, Ge, etc.), dielectrics, oxides (SiO2, Ta2O5, Al2O3, etc.), semiconductors and several alloys.
